| 1. | Spectral line shifts of h - like neon in hot and dense plasmas
类氢氖在高温高密度等离子体中的光谱漂移 |
| 2. | Practically , we designed a laser differential interferometer system for dense plasma density measurement
建立了适合于稠密等离子体测量的激光剪切差分干涉测量系统。 |
| 3. | 2 . the transport of a relativistic - electron - beam ( reb ) in dense plasmas with a cold return electron current is examined by theory and particle simulation
2 、系统地研究了高能电流在稠密等离子体内输运的复杂的非线性过程。 |
| 4. | In this dissertation , the background and the significance of differential interferometry for dense plasma density measurement were stated
本文阐述了激光差分干涉测量稠密等离子密度技术的研究背景和意义，综述了国内外等离子体密度测量技术的研究现状。 |
| 5. | Experimentally , the plasma produced by cable plasma gun ( c - gun ) and dense plasma focus ( dpf ) was measured by the laser differential interferometer system . the clear interference patterns were acquired at different time . the contour maps of line integral density and curves of radial local density at different height above nozzle were presented
实验上，对等离子体断路开关中的电缆等离子体枪( c - gun )和等离子体焦点装置( dpf )产生的等离子体进行了测量，获得了对应不同时刻的清晰的干涉图像，给出了线积分密度等值线图和距喷口不同高度处的径向密度分布。 |
| 6. | The common path defocusing 4f shearing interferometer in the system was constructed , which is fit for the dense plasma measurement . the advantages of this system consist in its stability and easy adjustment as the common path system and respective adjustability of shearing amount and stripe spatial frequency as m - z interferometer as well
设计了基于共光路结构的离焦4f剪切差分干涉仪，该干涉仪同时具有m - z型干涉仪的剪切量和条纹空间频率分别可调的优点以及共光路结构的稳定性和易于调节的优点，使得在稠密等离子体的测量中，系统参数可以兼顾小的剪切量和大的条纹空间频率。 |
| 7. | The magnetron sputtering method is adopted to grow single film samples , we take the precision measurement of stress by zygo interferometer . it is observed that growth of the mo component in multilayers is tensile , while si is compressive . study of stress in mo / si multilayers are carried out for application of extreme ultraviolet multilayer coatings in the diagnosed high dense plasmas and euvl
研究了mo 、 si单层膜的应力状态；采用磁控溅射法在超光滑si基底上制备了mo 、 si单层膜，利用zygo干涉仪对其进行应力检测，检测结果表明：在13nmmo si多层膜中， mo单层膜表现为张应力， si单层膜表现为压应力。 |
